| 摘要 |
<p>A process for producing chloromethylphenylacetic acid represented by formula (II) which comprises reacting methylphenylacetic acid represented by formula (I) with chlorine gas in an inert solvent under photoirradiation or in the presence of a radical initiator. According to this process, the methyl group of the methylphenylacetic acid can be chlorinated without resort to toxic sulfuryl chloride as a chlorinating agent and thus highly pure chloromethylphenylacetic acid can be produced at a high yield while inhibiting the formation of by-products such as the dichloro compound and the α-chloro compound.</p> |
