Direct imaging polymer fluid jet orifice

摘要

A process for creating and an apparatus employing shaped orifices in a semiconductor substrate (20). A layer of slow cross-linking material (34) is applied on the semiconductor substrate (20). An orifice image (42) and a fluid-well image (43) is transferred to the layer of slow cross-linking material (34). That portion of the layer of slow cross-linking material (34) where the orifice image (42) is located is then developed along with that portion of the layer of slow cross-linking material (34) where the fluid well image (43) is located to define an orifice opening in the semiconductor substrate (20). <IMAGE>