发明名称 |
Multi-zone illuminator for rapid thermal processing |
摘要 |
A system for rapid thermal processing of a substrate in a process chamber while measuring and controlling the temperature at the substrate to establish substantially uniform substrate temperature in real time. The system includes an axisymmetrical multi-zone illuminator having a plurality of substantially concentric rings of heating lamps to direct optical power toward said substrate, a fluid cooled optical reflector facing the substrate frontside and having a relatively high optical reflectivity. The system also includes a multizone temperature measurement system having a plurality of pyrometry sensors coupled to said multi-zone illuminator, a system for real-time measurement and compensation of substrate emissivity and illuminator lamp light interference effects, and a multi-variable temperature controller for providing multi-zone real-time temperature control. The system also incorpotates a plurality of illuminator lamp power supplies.
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申请公布号 |
US5937142(A) |
申请公布日期 |
1999.08.10 |
申请号 |
US19960678321 |
申请日期 |
1996.07.11 |
申请人 |
CVC PRODUCTS, INC. |
发明人 |
MOSLEHI, MEHRDAD M.;LEE, YONG JIN;KERMANI, AHMAD;MESSNER, WILLIAM J. |
分类号 |
C23C16/48;C30B25/10;C30B25/14;H01L21/00;(IPC1-7):A21B2/00;C23C16/00 |
主分类号 |
C23C16/48 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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