发明名称 |
Polymeric self-assembled mono- and multilayers and their use in photolithography |
摘要 |
A self-assembled multilayer and in particular polymeric self-assembled multilayer can be effectively produced from two or more self-assembled monolayers on a substrate where each of the self-assembled monolayers is produced for a block containing a first functional group and a second functional group where the second functional group is reacted with the first functional group. The production of polymerizable, self-assembled mono- and multi-layers from, e.g., blocks containing at least two acetylene groups and/or polymerizable end groups, is also provided. The polymerized mono- or multilayer can be employed in a variety of applications including photolithography.
|
申请公布号 |
US5885753(A) |
申请公布日期 |
1999.03.23 |
申请号 |
US19960631213 |
申请日期 |
1996.04.12 |
申请人 |
THE TEXAS A&M UNIVERSITY SYSTEM |
发明人 |
CROOKS, RICHARD M.;KIM, TAISUN;CHAN, KWOK-CHU;SCHOER, JONATHAN K. |
分类号 |
B05D1/18;G03F7/025;G03F7/16;(IPC1-7):G03C5/00;B32B31/00;B32B7/04 |
主分类号 |
B05D1/18 |
代理机构 |
|
代理人 |
|
主权项 |
|
地址 |
|