发明名称 METHOD AND DEVICE FOR ASCERTAINING CAUSE OF ABNORMALITY OF SURFACE OF MATERIAL
摘要 <p>A method for ascertaining the cause of abnormality of the surface of a material, comprising fixing the position on which a pulse laser beam is projected in an abnormal portion of the surface of a material, projecting a pulse laser beam on that position, projecting a pulse laser beam on a normal portion of the surface, comparing the spectrum obtained by spectral analysis of the light emitted from the irradiated abnormal portion with that of the light emitted from the irradiated normal portion, and ascertaining the cause of the abnormality based on chemical elements present in the abnormal and normal portions and on the difference between the intensities of lights emitted from the abnormal and normal portions. The pulse laser beam is repetitively projected to make a hole deep into the abnormal portion inside the material.</p>
申请公布号 WO1999005511(P1) 申请公布日期 1999.02.04
申请号 JP1998003361 申请日期 1998.07.28
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