发明名称 METHOD AND APPARATUS FOR EXPOSURE
摘要 <p>PROBLEM TO BE SOLVED: To prevent the result of height detection as datum for positional control from having an incorrect result by the underlying structure of a detected surface by detecting the height of a plurality of positions on an exposed surface through a confocal resonation system, and leveling the exposed substrate, based on the result of the detection. SOLUTION: A confocal optical system causes white light to be reflected from a half mirror 27, guides the white light into a pin hole 23 to pass the light through the hole (the pin hole 23 is in the confocal position), and irradiates a semiconductor wafer, that is, an exposed body, with the white light. The reflected light from the exposed body is launched into a photodetector 20 through a detection lens 21. A stage is moved to specified coordinates within the body to be exposed by means of the confocal optical system, and the image of a pattern specified from specified base pattern layouts is recognized. If there is no desired pattern on the focal plane at this time, the surface of the exposed body is moved up and down to search for a focal plane where there is a desired pattern and detect the height of the focal plane. An exposure field is leveled, based on the detected height.</p>
申请公布号 JPH1116822(A) 申请公布日期 1999.01.22
申请号 JP19970172322 申请日期 1997.06.27
申请人 SONY CORP 发明人 KAWAHIRA HIROICHI
分类号 H01L21/68;G03F7/20;G03F9/00;H01L21/027;(IPC1-7):H01L21/027 主分类号 H01L21/68
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