发明名称 Kapazitiver Sensor und Verfahren zur Herstellung
摘要 A small and highly sensitive capacitance type pressure sensor is obtained by filling an alkali halide material (2) such as KBr into a through-hole, forming a conductive thin film (4) on the surface, and dissolving and removing the alkali halide material (2). An insulating plate (1) disposed with a through-hole in the thickness direction is filled with a molten alkali halide material (2) such as KBr. After forming a conductive thin film (4) on the surface of the alkali halide material (2) filled into the through-hole and the vicinity thereof, the alkali halide material (2) is dissolved by water and removed. In this way, a diaphragm is made of the through-hole and the conductive thin film (4). A curve of the diaphragm caused by a pressure difference between the both faces of the conductive thin film (4) is detected as a capacitance change between the conductive thin film (4) and the electrode layer (6). <IMAGE> <IMAGE>
申请公布号 DE69412769(T2) 申请公布日期 1999.01.14
申请号 DE1994612769T 申请日期 1994.12.02
申请人 MATSUSHITA ELECTRIC INDUSTRIAL CO., LTD., KADOMA, OSAKA, JP 发明人 HAYASHI, SHIGENORI, GOSE-SHI, NARA 639-22, JP;KAMADA, TAKESHI, NARA-SHI, NARA 631, JP;TORII, HIDEO, HIGASHIOSAKA-SHI, OSAKA 578, JP;HIRAO, TAKASHI, MORIGUCHI-SHI, OSAKA 570, JP
分类号 G01D5/241;G01L9/00;G01P15/125;(IPC1-7):G01D5/24 主分类号 G01D5/241
代理机构 代理人
主权项
地址