| 摘要 |
PROBLEM TO BE SOLVED: To obtain the subject composition useful for polishing a memory hard disk or the like, capable of increasing polishing speed, giving a polishing surface of low surface roughness and preventing formation of surface defects, e.g. fine projections by containing a dissolved iron compound. SOLUTION: This composition comprises water and at least one type of abrasive selected from the group consisting of silicon dioxide, aluminum oxide, cerium oxide, zirconium oxide, titanium oxide, silicon nitride and manganese dioxide, and also contains an iron compound dissolved in the composition. It is preferable that the above iron compound is an iron (III) compound, in particular an iron salt of inorganic acid (e.g. iron (III) nitrate or iron (III) sulfate) or iron salt of organic acid (e.g. iron (III) citratye or iron (III) ammonium citrate), and present at 0.01 to 40wt.% based on the objective composition. |
