| 发明名称 |
Polishing composition |
| 摘要 |
A polishing composition comprising fumed silica, a basic potassium compound and water, of which the specific electric conductivity is from 100 to 5,500 mu S/cm. |
| 申请公布号 |
EP0846741(A1) |
申请公布日期 |
1998.06.10 |
| 申请号 |
EP19970309730 |
申请日期 |
1997.12.03 |
| 申请人 |
FUJIMI INCORPORATED |
发明人 |
MIURA, SHIROU;KAWAMURA, ATSUNORI;TAMAI, KAZUSEI |
| 分类号 |
B24B37/00;C01B33/18;C09G1/02;C09K3/14;H01L21/304;H01L21/306 |
主分类号 |
B24B37/00 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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