| 摘要 |
PROBLEM TO BE SOLVED: To facilitate best focusing by adjusting the focal point of an exposing means and making sharpest the part corresponding to the corner part in the image of a peculiar pattern acquired by an image acquiring means. SOLUTION: Pairs of peculiar pattern 21-23 each having three pointed corner parts in a shot region are formed on a reticle 14 in addition to a required semiconductor integrated circuit pattern 20. When a developed water 16 is set again in a wafer stepper and the surface image thereof is picked up by means of an image pickup means 30, a corner part of peculiar pattern can be fount out. When a corner part in the image having minimum roundness is located while shifting the focal position of an exposing means 17 appropriately by an adjusting means 31, an optical focal point can be determined and a best focus can be attained easily. Accuracy of exposure can be enhanced for following wafers by employing the adjusting amount of the adjusting means 31 at that time. |
