| 摘要 |
PROBLEM TO BE SOLVED: To obtain excellent peeling property and corrosion resistance by preparing a peeling liquid from water and at least one kind selected from among ammonium hydroxide, a quaternary ammonium hydroxide and an alkanolamine. SOLUTION: This peeling liquid for a resist film consists of an aq. soln. containing at least one kind selected from among ammonium hydroxide, a quaternary ammonium hydroxide and/or an alkanolamine. Thereby, the obtd. liquid has a function to peel a deposited film for protection of sidewalls of an etching pattern after a thin film of a ferroelectric material such as PZT is etched by using iridium or an iridium compd. as an electrode material. Further, if necessary, a sugar alcohol, a chelating agent and/or an org. solvent may be added to the soln. Thereby, noncorroding property for a wiring material is harmonized and the ability as a peeling liquid can be improved to peel a deposited film for protection of sidewalls of a resist pattern after a thin film made of a ferroelectric material containing a wiring material is etched. |
