MEASUREMENT APPARATUS OF WAFER MOVING

摘要

The wafer movement measuring device is constructed by the characteristic that a wafer movement measuring vernier(3)(4) having a box shape of a double structure made up of an interior box(7)(9) and an exterior box(8)910) is formed as a square box shape of the same size as that of the interior box(7)(9) within a space(1) on a reticle, and that the size for one exterior box(8)(10) of the left or right wafer movement measuring vernier(3)(4) is formed more largely than that for another exterior box.