FABRICATION METHOD OF SEMICONDUCTOR DEVICE,申请号JP19960099699-传众专利搜索

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发明名称	FABRICATION METHOD OF SEMICONDUCTOR DEVICE
摘要
申请公布号	JPH09289249(A)	申请公布日期	1997.11.04
申请号	JP19960099699	申请日期	1996.04.22
申请人	SONY CORP	发明人	SUGANO MICHIHIRO
分类号	H01L21/28;H01L21/265;H01L21/285;H01L21/336;H01L21/768;H01L29/78;(IPC1-7):H01L21/768	主分类号	H01L21/28
代理机构		代理人
主权项
地址

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