| 摘要 |
<p>A process control system which collects inspection information and picture information collected by means of inspection devices which inspect wafers for defects and are connected to each other through a communication network, builds a database or picture file, and defines a defect by combining elements featuring the defect based on the inspection information and picture information obtained by the inspection devices. Since the system can recognize a defect by dividing the features of the defect into small items by defining the defect, the system can identify the cause of the defect.</p> |
