VACUUM PROCESSING DEVICE AND METHOD OF OBTAINING TARGET WORKPIECE BY DEVICE

摘要

PROBLEM TO BE SOLVED: To judge the adhesion of workpiece for processing to the surface of the supporting surface of a supporting base in a vacuum processing device. SOLUTION: A device is arranged inside a vacuum processing chamber 1 and provided with the supporting base 2 of the workpiece for processing, of which supporting surface 201 is formed with an electrically insulating film 20 and a pedestal 22 that goes in and out of the surface 201. In the vacuum processing device that accepts a workpiece S for processing with the device, transfers it to the surface 201, introduces a processing gas into the container 1, excites the gas to the plasma by applying high frequency voltage and direct current voltage to the base 2, and holds the workpiece S for processing on the surface 201 by electrostatic suction, an electrostatic holding state measuring device M is provided.