| 摘要 |
PURPOSE: To obtain a resist compsn. excellent in sensitivity, resolution, the rate of a residual film and pattern shape. CONSTITUTION: In this resist compsn. contg. alkali-soluble phenolic resin and a quinonediazidosulfonic ester type photosensitive agent, the photosensitive agent is quinonediazidosulfonic ester of a phenolic compd. having structural units represented by the formula and obtd. by condensing phenol and cyclopentanone, cyclohexanone, 9-fluorenone, acetophenone or furfural. In the formula, X is a unit derived from cyclopentanone, cyclohexanone, 9-fluorenone, acetophenone or furfural. |
