| 摘要 |
PURPOSE: To obtain a resist compsn. having high sensitivity in a deep UV region and undergoing little change in sensitivity and image quality with the lapse of time after exposure. CONSTITUTION: This compsn. contains a photosensitive org. polymer obtd. by copolymerizing at least monomers represented by formulae I-III. The monomer represented by the formula I is used by 10-50mol% of the total amt. (100mol%) of the monomers, the monomer represented by the formula II is used by 1-10mol% of the total amt. and the amt. of the monomer represented by the formula III is the remaining amt. In the formulae I-III, each of R<1> , R<3> and R<5> is H or methyl, R<2> is a hydrophobic group such as alkyl or an acid- hydrolyzable group such as alkoxymethyl and R<4> is 1,2-naphthoquinonediazido-4 (or 5)-sulfonate. |
