| 摘要 |
<p>PURPOSE: To make it possible to clean the interior of a processing chamber without a lower electrode, and facilitate the assembly of a plasma processing system. CONSTITUTION: Two-stage vertical cylinders 16 that extend upward and retract its rods 17 are installed under a processing chamber 1. An ascending and descending base 6 is mounted on the top of the rods of the two-stage vertical cylinder. The base is provided with guide shafts 5 that hermetically connect to the bottom of the processing chamber, and a lower electrode 2 is placed on the top of the guide shafts. When a substrate is processed, the two-stage vertical cylinder is operated with the smaller stroke. When maintenance work, such as cleaning, is performed, it is operated with the larger stroke to largely move up the lower electrode. Thus a large space is provided between the lower electrode and the bottom of the processing chamber, which facilitates the cleaning of the area.</p> |
