| 摘要 |
A magnetron having at least first and second targets (15,23) from which material is sputtered in order to deposit a film on a substrate (11), each of the first and second targets being symmetrically shaped about an axis, the targets being held with their axes orientated parallel to each other and with a space between the targets in a direction orthogonal to the axes, having an anode arrangement comprising: first and second elongate anodes (71,73) with lengths thereof positioned parallel to the axes, the first and second anodes being spaced apart from the targets along sides thereof remote from the space, and at least a third elongate anode (99,101) positioned parallel to the axes and in the space between the first and second targets. <MATH> |
