| 摘要 |
PURPOSE:To adjust the sensitivity of a photopolymer in a new manner to give an improved degree of freedom by introducing monofunctional groups into an alkoxypoly(siloxane) derivative and adjusting its sensitivity based on the introduction ratio of the monofunctional groups. CONSTITUTION:1mol of, for example, poly(di-t-butoxysiloxane) of formula I, in which all of the terminals are hydroxyl groups and the side chains are t- butoxyl groups and which has a weight-average molecular weight of 1000 is dissolved in methyl isobutyl ketone, and the obtained solution is cooled with ice to 3 deg.C. 4mol of triethylsilyl chloride as a reactive monomer having a monofunctional group is added to the cooled solution, and 4mol of triethylamine is added dropwise to the solution. After the resulting solution is agitated for about 16hr at room temperature and the obtained reaction solution is filtered, the solvent is distilled off to leave a compound of formula II [wherein R is trimethylsilyl or H] in the form of colorless crystals. This compound and 0.02mol of triphenylsulfonium triflate as an acid generator are dissolved in methyl isobutyl ketone, and the solution is filtered to obtain a coating fluid of a photosensitive resin composition. |
