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发明名称
HIGH-FREQUENCY INDUCTION PLASMA SOURCE DEVICE FOR PLASMA TREATMENT
摘要
申请公布号
JPH088095(A)
申请公布日期
1996.01.12
申请号
JP19940210340
申请日期
1994.08.01
申请人
TEXAS INSTR INC <TI>
发明人
AJITO PII PARANJIPU
分类号
C23F4/00;H01J37/32;H01L21/3065;H05H1/46;(IPC1-7):H05H1/46
主分类号
C23F4/00
代理机构
代理人
主权项
地址
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