RUBBER BASED PHOTORESIST COMPOSITION

摘要

PURPOSE:To attain a uniform coating film thickness even when a large-sized substrate or a square mounted substrate is spin-coated with a rubber based photoresist compsn. by incorporating a solvent whose b.p. is within a specified range into the solvent of the compsn. CONSTITUTION:This rubber based photoresist compsn. is based on cyclized rubber and the solvent contains a solvent whose b.p. is within the range of 150-220 deg.C. In the case of <150 deg.C b.p., the difference in b.p. between the solvent and xylene is small and uniformity in coating film thickness is not attained. In the case of >220 deg.C b.p., the solvent remains in a thin film in a large quantity at the time of prebaking. The solvent, of this compsn. preferably contains 5-70wt.% of the solvent having 150-220 deg.C b.p. When xylene is used as the solvent of this compsn., decalin having a low volatility and satisfactory compatibility with xylene is most desirably used as the solvent having 150-220 deg.C b.p.