发明名称 Method of and apparatus for fabrication of photovoltaic cell.
摘要 <p>The present invention is intended to fabricate a photovoltaic cell which demonstrates high efficiency and low deterioration. The present invention is also intended to uniformly form this photovoltaic cell at a high speed on a large area without unevenness by a roll-to-roll method. A top cell of an i-type semiconductor layer is formed by an RF plasma CVD method and a middle cell and/or a bottom cell are formed by a microwave plasma CVD method. A top cell of an impurity-doped layer at an incident light side is formed by plasma doping and a middle cell and/or a bottom cell are formed by the RF plasma CVD method. The above-described objects are attained by providing film forming chambers respectively corresponding to the layers of a 2-layer or 3-layer tandem type photovoltaic cell and continuously forming semiconductor stacking films by a roll-to-roll method. <IMAGE></p>
申请公布号 EP0660422(A2) 申请公布日期 1995.06.28
申请号 EP19940309574 申请日期 1994.12.20
申请人 CANON KABUSHIKI KAISHA 发明人 FUJIOKA, YASUSHI, C/O CANON KABUSHIKI KAISHA;OKABE, SHOTARO, C/O CANON KABUSHIKI KAISHA;KANAI, MASAHIRO, C/O CANON KABUSHIKI KAISHA;TAMURA, HIDEO, C/O CANON KABUSHIKI KAISHA;YASUNO, ATSUSHI, C/O CANON KABUSHIKI KAISHA;SAKAI, AKIRA, C/O CANON KABUSHIKI KAISHA;HORI, TADASHI, C/O CANON KABUSHIKI KAISHA
分类号 H01L31/04;H01L31/075;H01L31/20;(IPC1-7):H01L31/20 主分类号 H01L31/04
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