发明名称 |
EXPOSURE APPARATUS AND METHOD |
摘要 |
An exposure apparatus and method wherein a mask (100) is illuminated with light and one of light transmitted through and light reflected from the illuminated mask is imaged onto a substrate. At least during imaging, transmission of this light from the illuminated mask is partially inhibited. More particularly, a spatial filter (3302) is utilized for inhibiting at least a portion of 0-order diffraction light. |
申请公布号 |
KR950003823(B1) |
申请公布日期 |
1995.04.20 |
申请号 |
KR19920003063 |
申请日期 |
1992.02.27 |
申请人 |
HITACHI LTD. |
发明人 |
NOGUCHI, MINORI;KENBO, YUKIO;OSHIDA, YOSHITADA;SHIBA, MASATAKA;YOSHITAKE, YASUHIRO;MURAYAMA, MAKOTO |
分类号 |
G03F1/08;G03F1/84;G03F7/20;H01L21/027;H01L21/30;(IPC1-7):G03F7/20 |
主分类号 |
G03F1/08 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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