发明名称 EXPOSURE APPARATUS AND METHOD
摘要 An exposure apparatus and method wherein a mask (100) is illuminated with light and one of light transmitted through and light reflected from the illuminated mask is imaged onto a substrate. At least during imaging, transmission of this light from the illuminated mask is partially inhibited. More particularly, a spatial filter (3302) is utilized for inhibiting at least a portion of 0-order diffraction light.
申请公布号 KR950003823(B1) 申请公布日期 1995.04.20
申请号 KR19920003063 申请日期 1992.02.27
申请人 HITACHI LTD. 发明人 NOGUCHI, MINORI;KENBO, YUKIO;OSHIDA, YOSHITADA;SHIBA, MASATAKA;YOSHITAKE, YASUHIRO;MURAYAMA, MAKOTO
分类号 G03F1/08;G03F1/84;G03F7/20;H01L21/027;H01L21/30;(IPC1-7):G03F7/20 主分类号 G03F1/08
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