| 发明名称 |
Method of forming SI-O containing coatings |
| 摘要 |
Disclosed is a method for forming improved Si-O containing coatings on electronic substrate. The method comprises converting hydrogen silsesquioxane resin into a Si-O containing ceramic coating in the presence of hydrogen gas. The resultant coatings have improved properties such as stable dielectric constants.
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| 申请公布号 |
US5320868(A) |
申请公布日期 |
1994.06.14 |
| 申请号 |
US19930119634 |
申请日期 |
1993.09.13 |
| 申请人 |
DOW CORNING CORPORATION |
发明人 |
BALLANCE, DAVID S.;MICHAEL, KEITH W. |
| 分类号 |
C04B41/84;C01B33/12;C04B35/622;C08G77/12;C09D183/04;C23C18/12;H01L21/312;H01L21/316;(IPC1-7):B05D3/02 |
主分类号 |
C04B41/84 |
| 代理机构 |
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代理人 |
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