WAFER PROCESSOR AND WAFER THROUGH PROCESSOR

摘要

PURPOSE:To shorten a wafer processing time by expediting drying of a wafer processed with processing solution (e.g. cleanser). CONSTITUTION:A wafer processor has a spin chuck 12 in a processing chamber 11, and comprises a heater 21 for heating a surface of the wafer 91 placed on the chuck 12 to expedite drying of the wafer 91 in the chamber 11. Or, the processor comprises a gas supply unit (not shown) for supplying dry gas to the surface of the wafer 91.