FORMATION OF PAD EXCLUSIVELY USED FOR MONITORING SEMICONDUCTOR INTEGRATED CIRCUIT, AND SEMICONDUCTOR INTEGRATED CIRCUIT,申请号JP19920120306-传众专利搜索

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发明名称	FORMATION OF PAD EXCLUSIVELY USED FOR MONITORING SEMICONDUCTOR INTEGRATED CIRCUIT, AND SEMICONDUCTOR INTEGRATED CIRCUIT
摘要
申请公布号	JPH05315417(A)	申请公布日期	1993.11.26
申请号	JP19920120306	申请日期	1992.05.13
申请人	HITACHI LTD	发明人	BABA TADASHI
分类号	G01R31/28;H01L21/66;H01L21/822;H01L27/04;(IPC1-7):H01L21/66	主分类号	G01R31/28
代理机构		代理人
主权项
地址

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