发明名称 POSITIVE TYPE PHOTORESIST COMPOSITION
摘要 PURPOSE:To form a microlens keeping such an excellent shape as to ensure a high degree of light convergence and having satisfactory transparency by using a compsn. contg. a specified polymer, a compd. having a quinonediazido group and a thermosetting resin or further contg. a specified triazine compd. CONSTITUTION:This positive type photoresist compsn. contains a hydroxystyrene-methyl methacrylate copolymer (A), a compd. (B) having a quinonediazido group and a thermosetting resin (C) or further contains a triazine compd. represented by the formula (where Z is a 4-alkoxyphenyl group or a group formed by condensing a benzene ring to the alkoxyphenyl group). The amt. of the component B used is 10-30 pts.wt., preferably 15-25 pts.wt. per 100 pts.wt. of the component A, that of the component C is 1-20 pts.wt., preferably 2-12 pts.wt. and that of the component D is 0.5-5 pts.wt., preferably 0.8-3 pts.wt.
申请公布号 JPH05158232(A) 申请公布日期 1993.06.25
申请号 JP19910073613 申请日期 1991.03.14
申请人 TOKYO OHKA KOGYO CO LTD 发明人 YAMAZAKI HIROYUKI;KOBAYASHI MASAICHI
分类号 G03F7/022;G02B1/04;G02B3/00;G03F7/033;G03F7/40;H01L21/027 主分类号 G03F7/022
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