| 摘要 |
A method for writing a pattern on a surface of an object by a focused electron beam with a minimized distortion of the electron beam comprises the steps of dividing the surface of the object into a plurality of parallel bands, moving the object in a direction perpendicular to the bands with a predetermined speed, achieving an exposure of the device pattern on an individual, band by band basis while moving the object with the predetermined speed. The predetermine speed is optimized with respect to an exposure interval representing a time interval in which the exposure of the band is possible. In order to minimize the distortion of the electron beam, the timing of the exposure of each band in each exposure interval is adjusted by (a) detecting a critical timing pattern that determines the optimized moving speed, (b) shifting the corresponding timing of exposure for each band, starting from the band immediately before the critical timing pattern and proceeding in a direction to the first band, such that the timing of exposure is shifted toward the center of the exposure interval to the extent that the exposure of any given band does not overlap the exposure of the next preceding band, and (c) repeating the step (b) for each of the remaining bands of the plurality of bands until the respective timing of exposure of each band reaches the center of the corresponding exposure interval.
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