发明名称 POSITIVE TYPE VISIBLE LIGHT SENSITIVE RESIN COMPOSITION
摘要 PURPOSE:To obtain the photosensitive resin composition high in sensitivity to visible light, especially, argon laser beams, and in resolution and superior in storage stability by using a specified compound and a p-aminobenzylidene derivative and the like. CONSTITUTION:This photosensitive resin composition comprises an alkali-soluble phenol resin, a compound of formula I to be allowed to restrain dissolution in alkali by mixing with the phenol, a diaryliodonium salt to be allowed to produce an acid, and the p-N-dialkylaminobenzylidene derivative of formula II having a function of spectrally sensitizing photodecomposition of the diaryliodonium salt. In formulae I and II, R is t-butyl or tetrahydropyranyl; n is 1-4; each of R1 and R2 is lower alkyl; X is H or alkoxycarbonyl or the like: Y is acyl or residual group from alkoxycarbonyl: and n is 0 or 1.
申请公布号 JPH0540342(A) 申请公布日期 1993.02.19
申请号 JP19910196646 申请日期 1991.08.06
申请人 TOPPAN PRINTING CO LTD 发明人 OE YASUSHI;ICHIMURA KUNIHIRO
分类号 B41C1/05;C08L61/04;C08L61/08;C08L101/08;G03F7/004;G03F7/029;G03F7/039;H01L21/027 主分类号 B41C1/05
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