| 摘要 |
The device is used during thermal treatment and deposition of metal and non-metal diffusion coatings. It is stable and reliable during operation, regardless of the high temperatures in the vacuum furnace. It is compact and has a uniform and continuous contour of the sputtering zone along the entire surface of the big rectangular target, upon which the products are uniformly coated and the wear of the target is reduced. The device consists of a cooled cathode (1), a cooled magnet system (6), and an anode, which has an additional thermal insulation via a graphite wool anode ring (9). The working gas is introduced and directed straight to the sputtering zone. The device is connected to the vacuum furnace by two flange connectors (5) and (6) and the compensation rings (17), which allows for different axial positions in the heated space. The indirectly cooled target (19) can be monolithic or made from strips of the same or different chemical composition for simultaneous multicomponent diffusion saturation. The magnetic system has an H-shaped single or expanded configuration.
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