| 摘要 |
PURPOSE:To prevent poor performance of rotation of a holder plate and a work resulting from unevenness of the work contacting pressure to a surface reference board, by pressurizing the holder plate locally. CONSTITUTION:A work 3 is held by a holder plate 4, which is supported by a stationary arm 6 and capable of rising and falling, and the material to be processed 3 is contacted and pressed to a rotating surface reference board 2 by sinking the holder plate 4, and thus undergoes polishing while a polish is supplied to the polishing surface. This surface polishing device is equipped with a pressing means due to a pressing cylinder 7 and a roller 8 at the periphery of the holder plate 4, and a local pressure is given thereto through adjustment of the pressure of the cylinder 7. |
