Ablation mask and use thereof.

摘要

An ablation mask that includes a transparent substrate (1) having a patterned layer (3) located between two dielectric transparent material coatings (2, 4) thereon is provided. Also, the ablation mask is useful in dry etching processes to provide patterned layers, and other laser processing applications that require high fluence such as photodeposition, thin film transfer and thin film release.