| 摘要 |
PURPOSE:To enable elimination speed of a thin film to be increased by providing a first light source which outputs a first beam by decomposing and eliminating the thin film and then by a second light source which outputs a second beam by promoting the eliminating reaction of the thin film by the first beam. CONSTITUTION:A first light source 1 which irradiates a first beam 1a dissolving and eliminating a thin film 3 and a second light source 2 which projects a second beam 2a promoting eliminating reaction of the thin film by the first beam 1a are provided. Then, if the beam 2a from the second light source 2 is projected to a part 3a of the thin film 3 which is to be eliminated before the irradiation with the beam 1a from the first light source 1, only the thin film at the concerned part can be preheated and is maintained to be at high temperature. If the first beam 1a is projected in this state, oxidation reaction of a thin-film molecule which is cut by the light energy of the first beam 1a is promoted and the thin-film molecule volatilizes speedily as CO2, H2O, etc., thus enabling a desired part of the thin film 3 to be eliminated at a speed which is suitable for practical application without deteriorating the characteristics of the thin film 3. |
