发明名称 Development system
摘要 A system for the development of exposed silver-halide films where the film moves emulsion-up on conveyor means, a viscous developer being applied to said film from a mechanism located above the moving film close to one end of the conveyor means, means being provided adjacent the other end to remove excess developer, means being provided for rinsing and fixing the developed film. The developer may be applied via a narrow slit at the bottom of a container, where the slit is essentially perpendicular to the direction of movement of the film. The uniformity of development layer may be attained by a roof-section above the moving film, the space being filled with developer.
申请公布号 US5034767(A) 申请公布日期 1991.07.23
申请号 US19880236841 申请日期 1988.08.26
申请人 HANETZ INTERNATIONAL INC. 发明人 NETZ, YOEL;HOFFMAN, ARNOLD
分类号 G03D5/00 主分类号 G03D5/00
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