| 摘要 |
PURPOSE:To accurately detect a position without an erroneous detection by a method wherein a shape is recognized by using a curved pattern which is difficult to use as a wiring of a semiconductor device. CONSTITUTION:In a lithographic process of a production process for semiconductor devices, one kind out of marks based on curves as shown in Fig. (a) to (c) is formed on a semiconductor substrate. That is to say, this mark is formed as a pattern of an oxide film, a nitride film or an wiring metal film on silicon according to the lithographic process. The mark formed in this manner is detected by using a shape recognition technique. When the mark based on the curves which are rarely used as wiring patterns is used, it is possible to prevent an erroneous detection and to detect a position with good accuracy. |
