发明名称 RADIATION-SENSITIVE, ETHYLENICALLY UNSATURATED, COPOLYMERIZABLE COMPOUNDS AND THEIR PREPARATION
摘要 -42- Radiation-sensitive, ethylenically unsaturated compounds and a process for their preparation. The ethylenically unsaturated organic compounds axe of the general formula (see formula I) where R is alkyl, aryl or a radical R1 and R1 is a radical (see formula II) where R2 to R6 are each H, alkyl, OH, OAlkyl, SH, SAlkyl, halogen, N(Alkyl)2 or N(Alkyl)(Aryl) and at least one but not more than three of the radicals R2 to R6 is or are a radical (see formula III) (see formula IV) where X is alkylene, cycloalkylene, oxaalkylene or arylene, Y is H or CH3- and Z is O or NY. The novel radiation-sensitive ethylenically unsaturated compounds are suitable for the preparation of polymeric radiation-sensitive compounds.
申请公布号 CA2005283(A1) 申请公布日期 1990.06.30
申请号 CA19892005283 申请日期 1989.12.12
申请人 BASF AKTIENGESELLSCHAFT 发明人 BOETTCHER, ANDREAS;REHMER, GERD
分类号 C07D335/16;C07C68/00;C07C68/02;C07C68/06;C07C69/96;C07C225/22;C07C231/12;C07C233/09;C07C255/56;C07C323/22;C07D295/10;C08F2/46;C08F2/48;C08F2/50;C08F20/10;C08F20/26;C08F20/34;C08F20/36;C08F20/38;C08F20/52;C08F20/54;C08F20/58;C08F20/60;C08G65/331;G03F7/027 主分类号 C07D335/16
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