发明名称 Process for producing design patterns on materials
摘要 A process for providing a design patterns in a material wherein a selected medium is applied to the material, the material being positioned adjacent a surface of a template which surface has selected surface characteristics either topographical or non-topographical in nature. The material is held against the template surface at a selected pressure and for a selected time period, at least a portion of the medium coming into contact with the template surface, the adhesive and conesive forces of the material, the medium, and the template interacting with each other to generate a unique design relief pattern on the surface of the material which pattern differs from the pattern characteristics of the template. The material is then suitably dried. The viscosity and amount of the medium, as well as the pressure used, are selected to lie within specified ranges to produce heavy or light relief patterns on permeable or non-permeable materials.
申请公布号 US4935083(A) 申请公布日期 1990.06.19
申请号 US19880231227 申请日期 1988.09.21
申请人 MASSACHUSETTS INST OF TECHNOLOGY 发明人 SILER, TODD L.
分类号 B05D1/40;B05D3/12;B05D5/02;B29C59/02;B44C1/20;D06P7/00 主分类号 B05D1/40
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