| 摘要 |
PURPOSE:To enable the maintenance of a discharge line for processing liquid to be performed easily in a short time by providing a filter mechanism for limiting the inflow of solids such that the mounting and removal may be possible. CONSTITUTION:A developing device 1 is provided with a cup 3 which surrounds the circumference of a semiconductor wafer 2, and to the bottom of this cup are connected a processing liquid exhaust pipe 8 and an air exhaust pipe 9. Hereby, when performing development of photoresist, the processing liquid which was used for processing flows into a filter storing part 10 once from the bottom of the cup 3 by the processing liquid exhaust pipe 8. And after passing through the filter 11, it fails into a receiving pan 12, and then it overflows out of this receiving pan 12 and is exhausted by the processing liquid exhaust pipe 8 which is connected to the bottom. Accordingly, in case that the semiconductor wafer is damaged by misoperation, the solid is caught by the filter and the receiving pan 12, and by cleaning these filter and receiving pan 12 it can be removed easily from the exhaust line. |
