| 摘要 |
PURPOSE:To improve the sensitivity and the resolution and the dry-etching durability of a resist material by using a polymer having a specified repeating unit as the resist material. CONSTITUTION:The resist material comprises the polymer having the repeating unit shown by the formula wherein X is halogen atom, R is hydrogen atom or a lower alkyl group, (n) is an integer of 20-20,000. The polymer is obtd. by homopolymerizing an alpha-halogen substd. acrylic acid ester, and the halogen atom substd. at alpha-position of said ester is preferably fluorine, chlorine or bromine atom, and the substituent group of a benzene ring is hydrogen atom or a lower alkyl group, and the lower alkyl group is preferably 1-5C alkyl group. Thus, the resist material having the high sensitivity and resolution and the excellent dye-etching durability is obtd. |
