| 摘要 |
PURPOSE:To form a desired film on a substrate and to prevent contamination of targets by rotating the shutter of a target part which has an aperture part and shielding part and is used in a sputtering device around the concentrical axis above the plural targets and moving the shutter vertically between the targets and the substrate. CONSTITUTION:The plural targets 2a, 2b are concentrically disposed to face the substrate 6 to be treated in a vacuum chamber 1. The disk-shaped shutter 3 of the target part having the aperture part 3a and the shielding part 3b is concentrically rotated by its driving shaft 4 relative to the plural targets and is moved vertically between the substrate 6 and the targets by the shaft 4. Only the target 2a adheres to the substrate 6 when the aperture part of the shutter 3 comes over the target 2a on movement of the shutter near to the targets. A high-frequency induction discharge hardly arises in the target 2b, since the spacing from the shutter 3 is small. The consumption of the target 2b is thus prevented. The contaminating material on the target surface is adhered to the shutter 3 by rising the shutter 3 to the substrate 6 side. The target surface is thereby cleaned.
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