| 摘要 |
PURPOSE:To uniformly coat the lower or both surfaces of a base material by providing a holding means exerting a force directed to the center of the base material from its periphery around the base material, and spin-coating both surfaces of the base material in a non-contact state. CONSTITUTION:In the spin-coating device having a means for holding a base material 10 and a rotating means, the means for holding the base material 10 is composed of the outer peripheral member 4 rotatively pivoted, plural arms 11 rotatively pivoted on the periphery of the outer peripheral member 4, a base material fixing claw 1 fixed to one end of each arm 11 and used for holding the base material 10 with the force directed to the center axis, and a member 7 for controlling the rotational position of the arm 11 by contact with the arm 11. As a result, both surfaces of the base material is spin-coated in a non-contact state, and a paint can be uniformly coated on the lower or both surfaces of the base material. The device is effectively utilized in the field where the thin film having uniform thickness for the antireflection plate of the lens and television, etc., is required. |
