| 摘要 |
<p>Improved Apparatus And Method For Evaporation Arc Stabilization Apparatus and method for evaporation arc stabilization including a target having a surface of material to be evaporated; circuitry for establishing an arc on the target surface for evaporating the target material, the arc being characterized by the presence of charged particles and a cathode spot which randomly migrates over the target surface; and a confinement ring contacting and surrounding the target surface, the ring being composed of a material such as boron nitride having (a) a secondary emission ratio less than one at the mean energies of the charged particles of the arc and (b) a surface energy less than that of the evaporated target material to thereby confine the cathode spot to the target surface. Further, the secondary emission ratio of the confinement ring is preferably less than that of the target. If the target is permeable, a permeable ring may also surround the target for effecting substantially uniform evaporation from the target. The confinement ring may also be employed as a cover for a permeable ring to prevent migration of the cathode spot onto the permeable ring during initial clean-up of the target.</p> |
