发明名称 SOLVOLYSIS-RESISTANT METHACRYLIC ACID ESTER COMPOUND
摘要 NEW MATERIAL:The compound of formula (R1-R3) are aromatic group; at least one of them is substituted phenyl having a substituent group having positive electrophilic substitution constant (ESC) at m- or p-position and the sum of each ESC is >=0.3). EXAMPLE:3-Chlorophenyldiphenylmethyl methacrylate. USE:A monomer for the production of optically active methacrylate polymer. The monomer is >=50 times more stable than triphenylmethyl methacrylate, and the polymer produced therefrom is expected to be useful as a filler for optical resolution having excellent solvolysis resistance and hydrolysis resistance. PREPARATION:The compound of formula can be produced e.g. by heating and refluxing methyl m-chlorobenzoate and phenylmagnesium bromide in anhydrous ether for 1hr, cooling with ice, adding chilled water dropwise to the reaction system, and collecting the separated other layer by decantation.
申请公布号 JPS61161242(A) 申请公布日期 1986.07.21
申请号 JP19850002987 申请日期 1985.01.11
申请人 DAICEL CHEM IND LTD 发明人 OKAMOTO YOSHIO;HATADA KOICHI;ICHIDA AKITO
分类号 C07C69/653 主分类号 C07C69/653
代理机构 代理人
主权项
地址