RADIATION CURABLE RESIST MATERIAL

摘要

PURPOSE:To obtain the titled material having a good sensitivity against a radiation such as an ultraviolet ray and an electron ray etc. and also to obtain a cured film having a good dry etching resistance by applying a condensation product obtd. from a specific bisphenol A as the resist material. CONSTITUTION:The above described resin is prepared by carrying out a polycondensation of the bisphenol A shown by the formula (wherein R is a methylol group, an acrylic acid ester or methacrylic acid ester of a methylol group; one or more of the acrylic acid ester or the methacrylic acid ester of the methylol group are contained in a monomer unit) as the monomer unit. For example, the above described resin is prepared by reacting bisphenol, formaldehyde and acrylic acid or methacrylic acid. As the obtd. resin is applied to the titled material, said material has the good sensitivity against the radiation and the good dry etching resistance.