| 摘要 |
<p>PURPOSE:To obtain a photomask capable of repelling attachment of foreign matters to the surface of the mask and easy to enhance mechanical strength and to handle it by fixing a protective plate same in material as the base of the photomask so as to cover the surface of the mask and filling the space between the base and the plate with a substance same in refractive index as both. CONSTITUTION:The photomask 3 made of the base 1 and the pattern film 2 is obtained by forming the mask pattern film 2 of Cr or the like on the surface of the base 1 made of a transparent quartz plate. The protective plate 4 made of a quartz plate same as that of the base 1 is arranged opposite to the surface of the base 1, and fixed above the base 1 by using a frame spacer 5 arranged on the border of the surface of the base 1 to form a minute space 6 equal to the height of the spacer 5 between the base 1 and the plate 4. The space 6 is filled with SOG (water glass) 7 as a transparent substance same in refractive index as said quartz. As a result, the pattern film 2 is on the surface of the base 1 covered with the plate 4, foreign matters are prevented from directly attaching to the surface of the base 1, and further, the use of the plate 4 enhances the mechanical strength, facilitates handling, and enhances durability and life.</p> |
