| 发明名称 |
IMPROVEMENTS IN OR RELATING TO APPARATUS FOR A REATIVE PLASMA PROCESS |
| 摘要 |
<p>The quality of a plasma etching process is improved by applying a DC potential (28') to one of the energizing electrodes (12') in the reaction chamber (11').The DC potential withdraws a small current from the plasma which causes the reaction to produce a uniform, controllable self-bias on the workpiece placed on the opposite (or second) electrode.</p> |
| 申请公布号 |
EP0031704(B1) |
申请公布日期 |
1985.10.23 |
| 申请号 |
EP19800304664 |
申请日期 |
1980.12.22 |
| 申请人 |
WESTERN ELECTRIC COMPANY, INCORPORATED |
发明人 |
KUYEL, BIROL |
| 分类号 |
H01L21/302;H01J37/32;H01L21/3065;(IPC1-7):H01J37/32 |
主分类号 |
H01L21/302 |
| 代理机构 |
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代理人 |
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| 主权项 |
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| 地址 |
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