| 摘要 |
PURPOSE:To enable to modify the constitution of a semiconductor integrated circuit on the way of the manufacturing process thereof by a method wherein ions are implanted in an unnecessary transistor only and the threshold value of the unnecessary transistor is contrived in such a way as to be able to modify. CONSTITUTION:A resist 15 is a mark made by a photo engraving method for modifying the constitution of the semiconductor integrated circuit. The resist 15 is not on an unnecessary transistor 4a', which raises the threshold value of the circuit, but is on a transistor 4a essential for constituting the circuit. Under this condition, by performing an ion-implantation in the transistor 4a', the threshold value of the transistor 4a' can be selectively raised and an ion implanted layer 10 is made. As a result, a modification of the circuit constitution can be easily performed and a practical integrated circuit can be obtained in a very shoft-term after the modification of the circuit constitution was decided. |
