发明名称 |
Exposure apparatus |
摘要 |
An exposure apparatus includes a reticle provided with at least one mark, and operates on a wafer provided with at least one mark. The apparatus further includes a projection optical system for optically conjugately relating the reticle to the wafer, a mark detecting apparatus for detecting the mark of the reticle and detecting the mark of the wafer through the projection optical system, an illuminator for illuminating the wafer with a sensitizing light, and a phase converting element fixed between the wafer and the reticle for varying the direction of polarization of a light coming from the mark provided on the wafer.
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申请公布号 |
US4521082(A) |
申请公布日期 |
1985.06.04 |
申请号 |
US19820401895 |
申请日期 |
1982.07.26 |
申请人 |
CANON KABUSHIKI KAISHA |
发明人 |
SUZUKI, AKIYOSHI;SATO, HIROSI;OMATA, TAKASHI;KOSUGI, MASAO |
分类号 |
G03B27/32;G03F7/20;G03F9/00;H01L21/027;H01L21/30;(IPC1-7):G02F1/01 |
主分类号 |
G03B27/32 |
代理机构 |
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代理人 |
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主权项 |
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地址 |
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