首页
产品
黄页
商标
征信
会员服务
注册
登录
全部
|
企业名
|
法人/股东/高管
|
品牌/产品
|
地址
|
经营范围
发明名称
UNIT FOR CARRYING OUT CHEMICAL REACTIONS
摘要
申请公布号
SU1036359(A1)
申请公布日期
1983.08.23
申请号
SU19782588979
申请日期
1978.03.01
申请人
KAPITONOV VLADIMIR M,SU
发明人
KAPITONOV VLADIMIR M,SU
分类号
B01J19/00;(IPC1-7):B01J19/00
主分类号
B01J19/00
代理机构
代理人
主权项
地址
您可能感兴趣的专利
IMAGE SENSORS INCLUDING DEPOSITED NEGATIVE FIXED CHARGE LAYERS ON PHOTOELECTRIC CONVERSION REGIONS AND METHODS OF FORMING THE SAME
SEMICONDUCTOR DEVICE MANUFACTURING METHOD AND SEMICONDUCTOR DEVICE
MULTIPLE FIN FINFET WITH LOW-RESISTANCE GATE STRUCTURE
A SEMICONDUCTOR DEVICE COMPRISING AN ESD PROTECTION DEVICE, AN ESD PROTECTION CIRCUITRY, AN INTEGRATED CIRCUIT AND A METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE
Semiconductor Device Having Features to Prevent Reverse Engineering
Anchoring Structure and Intermeshing Structure
Method of Packaging Semiconductor Devices and Apparatus for Performing the Same
SEMICONDUCTOR DEVICE
DISPLAY ELEMENT MANUFACTURING METHOD AND MANUFACTURING APPARATUS
SELECTIVELY DEGRADING CURRENT RESISTANCE OF FIELD EFFECT TRANSISTOR DEVICES
METHOD OF MANUFACTURING A SEMICONDUCTOR DEVICE
PIXELATED CAPACITANCE CONTROLLED ESC
SUBSTRATE ETCHING METHOD
TUNGSTEN SALICIDE GATE SOURCE FOR VERTICAL NAND STRING TO CONTROL ON CURRENT AND CELL PILLAR FABRICATION
Method for Improving E-Beam Lithography Gate Metal Profile for Enhanced Field Control
ION IMPLANTATION METHOD AND ION IMPLANTATION APPARATUS
SILICON CARBIDE SEMICONDUCTOR DEVICE AND METHOD OF MANUFACTURING SAME
METHOD FOR FORMING OXIDE SEMICONDUCTOR FILM AND METHOD FOR MANUFACTURING SEMICONDUCTOR DEVICE
SURFACE PLASMA MODIFICATION OF POROUS THIN-FILMS TO OPTIMIZE PORE FILLING
TRANSMISSION TYPE TARGET, RADIATION GENERATING TUBE HAVING THE TRANSMISSION TYPE TARGET, RADIATION GENERATOR HAVING THE RADIATION GENERATING TUBE, AND RADIATION IMAGING APPARATUS HAVING THE RADIATION GENERATOR